Epoxy curing agent News The world s first SEMI international standard for silicon carbide semiconductor epitaxial wafers compiled by Xiamen enterprises was officially released

The world s first SEMI international standard for silicon carbide semiconductor epitaxial wafers compiled by Xiamen enterprises was officially released

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In the second quarter of this year, the International Semiconductor Industry Association (SEMI) officially released the world’s first SEMI international standard for silicon carbide semiconductor epitaxial wafers – “4H-SiC Homoepitaxial Wafer Standard” (Specification for 4H-SiC Homoepitaxial Wafer) . This standard was compiled by Hantiancheng Electronic Technology (Xiamen) Co., Ltd., with the participation of 12 units including the Institute of Semiconductors of the Chinese Academy of Sciences, Zhuzhou CRRC Times Electric Co., Ltd., and Wolfspeed. It took nearly three years.

The International Semiconductor Industry Association (SEMI) is a global industry association dedicated to the development of international standards Formulated to actively promote the overall development of the supply chains of microelectronics, flat-panel displays, and solar photovoltaic industries. It represents the voice and demand of industries around the world, and is the vane of industry development trends. The release and implementation of the international standard “4H-SiC Homogeneous Epitaxial Wafer Standard” will have far-reaching significance in regulating the orderly development of the international silicon carbide semiconductor epitaxy industry, reducing the cost of international trade cooperation, and accelerating the promotion of new technologies around the world. .

For Hantiancheng, it is of great significance to successfully lead the preparation of the world’s first SEMI international standard for silicon carbide semiconductor epitaxial wafers. It will not only further establish Hantiancheng’s leading brand position in the silicon carbide semiconductor industry, but also further consolidate The right to speak and core competitiveness in the industry will help Hantiancheng to cooperate closely with upstream and downstream enterprises in the industry and make due contributions to jointly promote the steady progress and innovative development of the international silicon carbide semiconductor industry.

In addition to the international standards released and implemented this time, Hantiancheng has successfully led the compilation of 2 domestic group standards since its establishment in 2011, and participated in the preparation of 7 industry standards and group standards (including 1 Industry standards and 3 group standards have been released).

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