Photosensitive compound (PAC) is a commonly used photosensitive material for photoresist. my country’s enthusiasm for research and development continues to rise.

Photosensitive compound (PAC) refers to a compound containing naphthoquinone diazonium component that can produce chemical and physical changes internally after absorbing light energy. Photosensitive compounds have the characteristics of good photosensitivity and high photochemical activity, and have broad application prospects in the electronic and electrical fields.

Diazonaphthoquinone (DNQ), phenolic skeleton compounds, etc. are the main components of photosensitive compounds. Diazonaphthoquinone has the characteristics of good ultraviolet absorption and high photochemical activity. It can be used as the main raw material of positive resists, photoresist resins, and photosensitive materials, accounting for nearly 50% of the production cost of photosensitive compounds.

According to the “2023-2028 China Photosensitive Compound (PAC) Industry Market In-depth Research and Development Prospects Forecast Report released by the Industrial Research Center It shows that photosensitive compounds are mainly used in the electronic and electrical fields, and photoresist is its end product. Photosensitive compounds and photoacid generators are commonly used photosensitive materials for photoresists and can be used to prepare novolac resin system photoresists represented by g-line/i-line photoresists. As the country’s emphasis on the development of the semiconductor industry continues to increase, my country’s demand for photoresist applications continues to grow. In 2022, my country’s g-line/i-line photoresist market will reach 1.03 billion yuan, setting a record high. Photosensitive compounds can improve the photoresponse characteristics of photoresists. As the development of downstream industries accelerates, their market space will continue to expand.

In recent years, my country’s enthusiasm for research and development of photosensitive compounds has continued to rise, and local companies and related scientific research institutions have obtained a number of invention patents. In May 2022, the invention patent “Production Method for Diazonaphthoquinone Sulfonate Compound and Resin Composition” applied by Beijing Dingcai Technology Co., Ltd. was officially released. The production method involved in this patent has greatly improved the quality of photosensitive compounds. and performance, which improves the poor stability and easy environmental pollution caused by traditional production methods.

                                                                                                Benefiting from the increasing prosperity of the industry, the number of companies in the R&D and production tracks of the photosensitive compound industry in my country is constantly growing, which has led to increasingly fierce competition in the market. The main players in my country’s photosensitive compound market include Rongda Photosensitive, Wanrun Co., Ltd., China Star Optoelectronics, Sun Moon Star Technology, Jingfan New Materials, Seth Photosensitive Materials, Ruiyang Chemical, etc. However, at present, compared with overseas developed countries, my country’s photosensitive compound technology is relatively backward, its production capacity cannot meet downstream production needs, and its products are highly dependent on imports. This is the main challenge facing the development of the industry.

Industry analysts said that photosensitive compounds, as important raw materials for photoresist, have good prospects for industry development. In the future, as the g-line/i-line photoresist market space continues to expand, the application demand for photosensitive compounds in my country will further grow. At present, due to factors such as high technical barriers and high production costs, my country’s photosensitive compounds are highly dependent on imports. In the future, with the improvement of independent research and development capabilities of local enterprises, the localization process of my country’s photosensitive compound market is expected to accelerate.