Photoresist developer market demand is strong and my country’s industry concentration is high

Photoresist developer, also known as photoresist developer, refers to a chemical solvent used to dissolve the soluble areas of photoresist caused by exposure. The temperature and concentration of the photoresist developer play a decisive role in the final pattern edge roughness and sensitivity of the photoresist. According to the different photoresists used, it can be divided into positive photoresist developers and negative photoresists. There are two types of resist developers.

Tetramethylammonium hydroxide solution (TMAH) is the main component of photoresist developer. It is highly alkaline, easy to deliquesce, and non-polluting to silicone products. As an electronic chemical, it can be used to produce CMP cleaning fluids, Photoresist developers and other products. In recent years, benefiting from national policy support and the improvement of independent research and development capabilities of local enterprises, my country’s tetramethylammonium hydroxide production process has gradually developed in a green direction, and its production capacity and output have also been further improved. This has provided a good foundation for the development of the photoresist developer industry. Provide favorable conditions.

According to the “2023-2028 China Photoresist Developer Industry Market In-depth Research and Development Prospects Forecast Report released by the Industrial Research Center Display and photoresist developers are mainly used in display panels, semiconductors and other fields. In the field of display panels, photoresist developers can be used to manufacture flexible OLED display screens, LCD liquid crystal displays, etc.; in the field of semiconductors, photoresist developers can be used in photolithography processes to remove unexposed parts of semiconductors. Benefiting from the accelerated development of downstream industries, the market demand for photoresist developers is increasingly strong.

The main global photoresist developer manufacturers include BASF of Germany, Ashland of the United States, Mitsubishi Chemical of Japan, etc. my country’s photoresist developer industry is highly concentrated, with leading companies occupying a dominant position in the market. Hangzhou Glinda Electronic Materials Co., Ltd., Xilong Science Co., Ltd., Jiangsu Aoshou Material Technology Co., Ltd., Suzhou Ruihong Electronic Chemicals Co., Ltd., etc. are major players in my country’s photoresist developer market.

Compared with overseas developed countries, my country’s photoresist developer industry started late, and its product quality and performance are relatively poor. In recent years, as local companies continue to increase their investment in research and development, my country’s photoresist developer industry has gradually developed towards high performance and high quality. Greenda is my country’s leading photoresist developer company, occupying nearly 50% of the market share. It focuses on the research and development, production and sales of ultra-clean and high-purity wet electronic chemicals. TMAH developer (positive photoresist developer) The production capacity reaches 90,000 tons, and the products have been widely used in ultra-precision integrated circuits.

Industry analysts said that my country’s photoresist developer industry has entered a stage of rapid development and has good application prospects. However, at present, there is still a gap between my country’s photoresist developer technology level and product quality compared with overseas developed countries. In the future, with the growth of market demand and the improvement of independent research and development capabilities of local companies, my country’s market share of high-performance photoresist developers will increase.